Minghao Zhang,1,? Guoyang Wang,1,? Yizhuo Zhang,1 Wen Xiao,1 Cunlin Zhang,1 Yi Liu,2,3,* Vladimir Tikhonchuk4,5,* and Liangliang Zhang1,*
首都師范大學(xué)張亮亮研究員，上海理工大學(xué)劉一教授，法國波爾多大學(xué)Vladimir Tikhonchuk教授
1 Key Laboratory of Terahertz Optoelectronics (Ministry of Education), Department of Physics, Capital Normal University, Beijing, 100048 China
2 Shanghai Key Lab of Modern Optical System, University of Shanghai for Science and Technology, 516, Jungong Road, Shanghai, 200093 China
3 CAS Center for Excellence in Ultra-intense Laser Science, Shanghai, 201800 China
4 Centre Lasers Intenses et Applications, Université de Bordeaux–CNRS–CEA, 351 Cours de la Libération, Talence Cedex, 33405 France
5 Extreme Light Infrastructure ERIC, ELI-Beamlines Facility, Za Radnicic 835, Dolní B?e?any, 25241 Czech Republic
? M.Z. and G.W. contributed equally to this work.
